KU Leuven 等机构研究干法沉积 ZIF 光刻胶在 EUV 与电子束下的色调差异
Dry-Deposited Resist Shows Different Tone Behavior Under EUV And E-Beam Exposure (KU Leuven, Kunsan, VUB, Imec)
KU Leuven、群山国立大学、布鲁塞尔自由大学与 imec 等机构发表论文，报告一种完全采用干法沉积的卤化非晶沸石咪唑酯骨架（a-ZIF）光刻胶，其在电子束与极紫外曝光下表现出明显的、依赖辐照源的色调转换。
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Researchers at KU Leuven, Kunsan National University, Vrije Universiteit Brussel, imec, et al. published “Irradiation-Source-Dependent Tone Conversion in Dry-Deposited Halogenated Amorphous Zeolitic Imidazolate Framework Resists for Electron-Beam and Extreme Ultraviolet Lithography.” Abstract Excerpt: “Dry-deposited metal–organic resists are key enablers for advanced patterning processes in next-generation semiconductor manufacturing. Here, we report halogenated amorphous zeolitic imidazolate framework... » read more The post Dry-Deposited Resist Shows Different Tone Behavior Under EUV And E-Beam Exposure (KU Leuven, Kunsan, VUB, Imec) appeared first on Semiconductor Engineering .
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来源：Semiconductor Engineering · semiengineering.com