中科院等团队研究 Pt-W 合金作 High-NA EUV 掩模吸收层
Pt-W Alloy Shows Potential For Thinner High-NA EUV Mask Absorbers (Chinese Academy of Sciences et al.)
中国科学院、吉林大学等单位的研究人员在 iScience 发表论文，评估 Pt-W 合金作为下一代低折射率 EUV 掩模吸收层。论文题为《Evaluating an alternative Pt-W alloy as a low-n EUV mask absorber: Film properties and imaging performance》，发表于 2026 年 8 月。
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Researchers at Chinese Academy of Sciences, Jilin University, State Key Laboratory of Advanced Manufacturing for Optical Systems, and University of Chinese Academy of Sciences published a technical paper titled “Evaluating an alternative Pt-W alloy as a low-n EUV mask absorber: Film properties and imaging performance.” “In this study, we investigate an alternative Pt-W alloy as... » read more The post Pt-W Alloy Shows Potential For Thinner High-NA EUV Mask Absorbers (Chinese Academy of Sciences et al.) appeared first on Semiconductor Engineering .
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来源：Semiconductor Engineering · semiengineering.com