DigiTimes· Charlene Chen·· 5 小时前
Intel CTO：与台积电制程差距缩小至几个百分点，但规模仍落后
Intel CTO: process gap with TSMC down to a few points, but scale still lags
事实摘要
Intel CTO 表示，Intel 与台积电的制程差距已缩小到几个百分点，但在规模上仍然落后。
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正文 · 原文摘要
Technology podcast host Dwarkesh Patel recently released a special episode after spending two days touring Intel's fabs and research laboratories and speaking with several technology leaders. Intel CTO Pushkar Ranade said the company's process technology is now only a few percentage points behind TSMC, although catching up in manufacturing scale will take considerably longer.
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来源：DigiTimes · digitimes.com